Wetting in high-temperature materials processing: The case of Ni/MgO and NiW10/MgO

Received 25 January 2010; received in revised form 25 February 2010; accepted 1 March 2010. published online 08 March 2010.

Abstract

The wetting behavior of liquid Ni and NiW10 on MgO(100) single crystals was examined by the sessile drop method at 1773K in flowing Ar. A special procedure was used for in situ opening of the Ni/MgO and NiW10/MgO interfaces directly during wettability test at high temperature. Scanning probe microscopy revealed evidence of strong surface modification of MgO(100) during wettability tests that was found to be affected by metal evaporation, the chemistry of the liquid metal and the primary oxide film.

Keywords: Triple line, Sessile drop, Ridging, Scanning probe microscopy

a Foundry Research Institute, Zakopianska St. 73, 30418 Cracow, Poland

b Department of Engineering & Technology, University of Wisconsin-Stout, Menomonie, WI 54751, USA

c Energy Industries of Ohio, Park Center Plaza, Suite 200, 6100 Oak Tree Boulevard, Independence, OH 44131, USA

Corresponding author. Tel.: +48 12 2618526; fax: +48 12 2660870.

PII: S1359-6462(10)00132-6

doi:10.1016/j.scriptamat.2010.03.003

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