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Volume 62, Issue 9, Pages 643-645 (May 2010)


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Strong orange–red light emissions from amorphous silicon nitride films grown at high pressures

Rui HuangaCorresponding Author Informationemail address, Xiang Wanga, Jie Songa, Yanqing Guoa, Honglin Dinga, Danqing Wangb, Jun Xub, Kunji Chenb

Received 11 December 2009; accepted 8 January 2010. published online 13 January 2010.

We observed very bright orange–red light emissions from amorphous silicon nitride prepared under high-pressure deposition conditions. By increasing the pressure from 300 to 700Pa, the photoluminescence (PL) intensity could be more than doubled. The introduction of N–H bonds is shown to play a key role in enhancing the PL intensity of the films. The improved PL intensity is attributed to the good hydrogen passivation of nonradiative defect states related to N under high growth pressures.

a Department of Physics and Electrical Engineering, Hanshan Normal University, Chaozhou, Guangdong 521041, People’s Republic of China

b State Key Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, People’s Republic of China

Corresponding Author InformationCorresponding author.

PII: S1359-6462(10)00016-3

doi:10.1016/j.scriptamat.2010.01.015


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